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Semiconductor Industry-Specific Nitrogen Generator (Chamber Protection Gas, Dry Pump Purge Gas)-NITROGEN-M-100/200
Description:Peculiar has specially designed a safe, efficient, and convenient nitrogen generator for the unique requirements of nitrogen flow, purity, and pressure in semiconductor applications, electron microscope chamber protection, and more.
Product model:NITROGEN-M-100/200
Peculiar has specially designed a safe, efficient, and convenient nitrogen generator for the unique requirements of nitrogen flow, purity, and pressure in semiconductor applications, electron microscope chamber protection, and more. It produces clean, dry nitrogen with a purity of up to 99.5%, fully meeting the requirements for chamber protection gas and dry pump purge gas in the semiconductor industry, including APCI and ESI interfaces. The nitrogen generator utilizes membrane separation technology, eliminating the need for secondary purification, and continuously delivers clean, dry, phthalate-free nitrogen. The nitrogen purity and flow rate are stable, with a long service life. An external vortex compressor enhances the safety of air supply, with a flow rate range from 0-100L/min, capable of supplying nitrogen to one or multiple instruments simultaneously. Special models can be customized, with the maximum flow rate range reaching up to 200L/min.
◎ Traffic:0-100/200L/min @100psi(7bar)
◎ Work environment:5°C-40°C Humidity80%
◎ Using the highest altitude:2200m
◎ Dew point:<-55
◎ Granules:<0.01μm
◎ No retained liquid.
◎ Phthalic acid: None
◎ Noise:<47dB(A)
◎ Boot purification time:30min
◎ Power:8000W
◎ Power requirements:220V 50HZ